Image sensor chip package and method for forming the same

ABSTRACT

A method for forming an image sensor chip package includes: providing a substrate having predetermined scribe lines defined thereon, wherein the predetermined scribe lines define device regions and each of the device regions has at least a device formed therein; disposing a support substrate on a first surface of the substrate; forming at least a spacer layer between the support substrate and the substrate, wherein the spacer layer covers the predetermined scribe lines; forming a package layer on a second surface of the substrate; forming conducting structures on the second surface of the substrate, wherein the conducting structures are electrically connected to the corresponding device in corresponding one of the device regions, respectively; and dicing along the predetermined scribe lines such that the support substrate is removed from the substrate and the substrate is separated into a plurality of individual image sensor chip packages.

CROSS REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of U.S. Provisional Application No.61/377,223, filed on Aug. 26, 2010, the entirety of which isincorporated by reference herein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a chip package, and in particularrelates to an image sensor chip package.

2. Description of the Related Art

An image sensor chip package typically includes an image sensor chip anda transparent substrate disposed thereon. The transparent substrate mayserve as a support during the fabrication process of the image sensorchip package such that the fabrication process is favorably performed.

However, the transparent substrate may more or less absorb, refract,and/or reflect a portion of the light entering a sensing device regionof the image sensor chip package, thus affecting the image sensingquality of the image sensor chip. In addition, because of the lighterand smaller product trends for electronic products, the existence of thetransparent substrate hinders the degree in which an image sensor chippackage may be shrunk. Meanwhile, a transparent substrate having asufficient optical quality is not cheap.

Thus, it is desired to reduce the affection on light sensing due to thetransparent substrate and further reduce the size of the image sensorchip package.

BRIEF SUMMARY OF THE INVENTION

An embodiment of the invention provides a method for forming an imagesensor chip package, comprising: providing a substrate having aplurality of predetermined scribe lines defined thereon, wherein thepredetermined scribe lines define a plurality of device regions in thesubstrate and each of the device regions has at least a device formedtherein; disposing a support substrate on a first surface of thesubstrate; forming at least a spacer layer between the support substrateand the substrate, wherein the spacer layer overlaps the predeterminedscribe lines; forming a package layer on a second surface of thesubstrate; forming a plurality of conducting structures on the secondsurface of the substrate, wherein the conducting structures areelectrically connected to the corresponding device in corresponding oneof the device regions, respectively; and performing a dicing processincluding dicing the support substrate, the spacer layer, and thesubstrate along the predetermined scribe lines such that the supportsubstrate is removed from the substrate and the substrate is separatedinto a plurality of individual image sensor chip packages.

An embodiment of the invention provides an image sensor chip package,comprising: an image sensor chip having an upper surface and a lowersurface and having a light sensing device disposed at the upper surface;an optical element disposed on the light sensing device, wherein theoptical element has a light receiving surface; a conducting layerextending from the lower surface towards the upper surface of the imagesensor chip and electrically connected to the light sensing device; anda package layer formed on the lower surface of the image sensor chip andthe conducting layer, wherein a shortest distance between the lightreceiving surface and a bottom surface of the package layer is notlarger than about 130 μm.

An embodiment of the invention provides an image sensor chip package,comprising: an image sensor chip having an upper surface and a lowersurface and having a light sensing device disposed at the upper surface;an optical element disposed on the light sensing device, wherein theoptical element has a light receiving surface; a conducting layerextending from the lower surface towards the upper surface of the imagesensor chip and electrically connected to the light sensing device; anda package layer formed on the lower surface of the image sensor chip andthe conducting layer, wherein no support substrate is disposed on thelight receiving surface.

A detailed description is given in the following embodiments withreference to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention can be more fully understood by reading thesubsequent detailed description and examples with references made to theaccompanying drawings, wherein:

FIGS. 1A-1K are cross-sectional views showing the steps of forming animage sensor chip package according to an embodiment of the presentinvention; and

FIG. 2 is a top view showing a substrate in an embodiment of the presentinvention.

DETAILED DESCRIPTION OF THE INVENTION

The following description is of the best-contemplated mode of carryingout the invention. This description is made for the purpose ofillustrating the general principles of the invention and should not betaken in a limiting sense. The scope of the invention is best determinedby reference to the appended claims.

The manufacturing method and method for using the embodiments of theinvention are illustrated in detail as follows. It is understood, thatthe following disclosure provides many different embodiments, orexamples, for implementing different features of the invention. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. In addition, the present disclosure mayrepeat reference numbers and/or letters in the various examples. Thisrepetition is for the purpose of simplicity and clarity and does not initself dictate a relationship between the various embodiments and/orconfigurations discussed. Furthermore, descriptions of a first layer“on,” “overlying,” (and like descriptions) a second layer, includeembodiments where the first and second layers are in direct contact andthose where one or more layers are interposing the first and secondlayers.

A chip package according to an embodiment of the present invention maybe used to package an image sensor chip. However, embodiments of theinvention are not limited thereto. For example, the chip package of theembodiments of the invention may be applied to active or passivedevices, or electronic components with digital or analog circuits, suchas opto electronic devices, micro electro mechanical systems (MEMS),micro fluidic systems, and physical sensors for detecting heat, light,or pressure. Particularly, a wafer scale package (WSP) process may beapplied to package semiconductor chips, such as image sensor devices,light-emitting diodes (LEDs), solar cells, RF circuits, accelerators,gyroscopes, micro actuators, surface acoustic wave devices, pressuresensors, ink printer heads, or power modules.

The wafer scale package process mentioned above mainly means that afterthe package process is accomplished during the wafer stage, the waferwith chips is cut to obtain separate independent packages. However, in aspecific embodiment, separate independent chips may be redistributedoverlying a supporting wafer and then be packaged, which may also bereferred to as a wafer scale package process. In addition, the abovementioned wafer scale package process may also be adapted to form chippackages of multi-layer integrated circuit devices by stacking aplurality of wafers having integrated circuits.

FIGS. 1A-1K are cross-sectional views showing the steps of forming animage sensor chip package according to an embodiment of the presentinvention. As shown in FIG. 1A, a substrate 100 is provided, which is,for example, a semiconductor substrate. In one embodiment, the substrate100 is a silicon wafer, and thus a wafer-level package process may beperformed to reduce fabrication time and cost. The substrate 100 mayinclude a plurality of predetermined scribe lines SC defined therein.The predetermined scribe lines SC define a plurality of device regions Ain the substrate 100. The device regions A may include at least a device102 formed therein, respectively. The device 102 may be a variety ofelectronic devices such as (but is not limited to) an image sensordevice. If the device 102 is an image sensor device or anotheroptoelectronic device, an optical element 108 may be optionally disposedon the device 102. The optical element 108 may be, for example, (but isnot limited to) a microlens or a microlens array.

FIG. 2 shows a top view of the substrate 100 in one embodiment. Thepredetermined scribe lines SC of the substrate 100 may include aplurality of first direction predetermined scribe lines SC1, which aresubstantially parallel to a first direction, and a plurality of seconddirection predetermined scribe lines SC2, which are substantiallyparallel to a second direction. In one embodiment, the first directionis substantially perpendicular to the second direction.

Referring to FIG. 1A, a support substrate 104 is disposed on a surface100 a of the substrate 100. The support substrate 104 may be atransparent substrate such as a glass substrate. In one embodiment, aspacer material layer is first formed on a surface of the supportsubstrate 104 facing the surface of the substrate, and then the spacermaterial layer is patterned into at least a spacer layer 106. Thepattern of the spacer layer 106 may be substantially similar to andcorresponds to the predetermined scribe lines SC of the substrate 100.When the support substrate 104 is disposed on the substrate 100, thespacer layer 106 may bond with the substrate 100 and may cover andoverlap the predetermined scribe lines SC of the substrate 100.

Next, as shown in FIG. 1B, the support substrate 104 may then be used asa support and following process steps are performed on the surface 100 bof the substrate 100. For example, a thinning process may be performedon the surface 100 b of the substrate 100 to thin the substrate 100 to apredetermined thickness. A suitable thinning process is, for example, agrinding process or a chemical mechanical polishing (CMP) process. Then,a plurality of through substrate conducting structures 110 may be formedin the substrate 100. The through substrate conducting structures 110may be electrically connected to corresponding devices. For example, inone embodiment, the substrate 100 includes a conducting pad (not shown)electrically connected to the device 102. In this case, a through-holeexposing the conducting pad may be formed, and the through-hole may befilled with a conducting material to form the through-substrateconducting structure 110. The through substrate conducting structures110 may further include a conducting layer extending on the surface 100b of the substrate 100. In one embodiment, in order to prevent a shortbetween the through substrate conducting structures 110 and thesubstrate 100, an insulating layer (not shown) may be formed between thesubstrate 100 and the through substrate conducting structure 110.

In one embodiment, after the through-hole exposing the conducting pad isformed, an insulating layer may be conformally formed on a sidewall anda bottom of the through-hole. For example, the insulating layer may beformed by chemical vapor deposition. Then, the insulating layer locatedon the bottom of the through-hole is removed to expose the conductingpad. Then, an electroplating seed layer is formed on the sidewall andthe bottom of the through-hole by, for example, physical vapordeposition. The electroplating seed layer may extend onto the surface100 b of the substrate 100. Then, a patterned mask layer may be formedon the electroplating seed layer, and a conducting layer iselectroplated on the exposed electroplating seed layer. Then, thepatterned mask layer is removed, and the portion of the electroplatingseed layer where no conducting layer is formed is etched and removed.Thus, the through substrate conducting structures 110 is formed in thesubstrate 100, which may further include a patterned conducting layerextending on the surface 100 b of the substrate 100.

As shown in FIG. 1B, a package layer 112 and a conducting structure 114may then be formed on the surface 100 b of the substrate 100. Thepackage layer 112 may be, for example, (but is not limited to) a soldermask layer. The conducting structure 114 is, for example, a solder ball,and may be electrically connected to the device 102 through the throughsubstrate conducting structures 110.

Then, a dicing process is performed, which may include dicing thesupport substrate 104, the spacer layer 106, and the substrate 100 alongthe predetermined scribe lines SC such that the support substrate 104 isseparated from the substrate 100, and the substrate 100 is divided intoa plurality of separate image sensor chip packages. The dicing processaccording to an embodiment of the present invention is furtherillustrated in more detail in the following.

As shown in FIG. 1C, in one embodiment, before the dicing process isperformed, a support substrate 116 may be optionally disposed on thesurface 100 b of the substrate 100 to facilitate following processes.The support substrate 116 may be adhered on the surface 100 b of thesubstrate 100 through, for example, an adhesion layer 118. The adhesionlayer 118 may be a two-sided UV tape, wherein a side of the two-sided UVtape is adhered onto the support substrate 116, and another side of thetwo-sided UV tape is adhered onto the conducting structure 114 on thesurface 100 b of the substrate 100.

In one embodiment, the dicing process is stepwise performed. Referringto FIGS. 1D and 2, a portion of the support substrate 104 and a portionof the spacer layers 106 covering the first direction predeterminedscribe lines SC may be diced and removed from the surface 104 a of thesupport substrate 104 along the first direction predetermined scribelines SC1. In one embodiment, a fix layer (not shown) may be optionallyformed on the surface 104 a of the support substrate 104 to facilitatefollowing dicing processes. The fix layer may be an adhesive tape. Whenthe portion of the support substrate 104 and the spacer layers 106 onthe first direction predetermined scribe lines SC1 are diced andremoved, the fix layer may be used to hold the support substrate 104.

As shown in FIG. 1E, after the portion of the support substrate 104 isdiced and removed, a fix layer 120 is formed on the surface 104 a of thesupport substrate 104 to facilitate following dicing processes. The fixlayer 120 may be an adhesive tape.

As shown in FIG. 1F, a portion of the fix layer 120, a portion of thesupport substrate 104, and a portion of the spacer layers 106 coveringthe second direction predetermined scribe lines SC2 are then diced andremoved from the surface 104 a of the support substrate 104 along thesecond direction predetermined scribe lines SC2. Because the supportsubstrate 104 is fixed on the substrate 100 through the spacer layers106, when the spacer layers 106 on the scribe lines (SC1 and SC2) aresubstantially and completely removed in the dicing process, the supportlayer 104 and the fix layer 120 are naturally separated from thesubstrate 100, as shown in FIG. 1G.

Next, as shown in FIG. 1H, after the support substrate 104 and the fixlayer 120 are removed from the substrate 100, a portion of the substrate100 may be diced and removed from the surface 100 a of the substrate 100along the first direction predetermined scribe lines SC1 and the seconddirection predetermined scribe lines SC2 such that the substrate 100 isseparated into a plurality of image sensor chip packages 10 which areseparated from each other.

Due to the dicing process mentioned above, the support substrate 104 maybe naturally removed after the dicing process is performed. Thus, thesize of the image sensor package 10 may be reduced. Further, because thesupport substrate 104 is removed, light may be received by the device102 more favorably. Note that because the support substrate 104 ismerely used as a temporary support substrate, the optical quality of thesupport substrate may not need to be as good as that of a transparentsubstrate (top cover) of a conventional image sensor chip package. Thus,fabrication cost may be reduced.

As shown in FIG. 1I, for the convenience of transportation and/orprocessing of the formed plurality of image sensor chip packages 10, afilm frame 122 may be further attached on the image sensor chippackages. In one embodiment, a process (such as light irradiationprocess or another suitable process) may be first applied to theadhesion layer 118 to reduce the adhesion of the adhesion layer 118 totransform the adhesion layer into an adhesion layer 118′ with lowadhesion for easy removal in a following process.

As shown in FIG. 1J, because the treated adhesion layer 118′ has a lowadhesion, the adhesion layer 118′ and the support substrate 116 may beremoved from the image sensor chips 10, which have been separated, moreeasily.

The plurality of image sensor chip packages 10 fixed on the film frame122 may then be picked up according to requirements and be integratedinto another electronic element, such as a printed circuit board.

FIG. 1K is a cross-sectional view showing an image sensor chip package10 according to an embodiment of the present invention. In oneembodiment, the image sensor chip package 10 includes an image sensorchip 100 (i.e., a portion of the substrate 100 after being diced), whichhas an upper surface 100 a and a lower surface 100 b, wherein a lightsensing device 102 is disposed at the upper surface 100 a. In oneembodiment, an optical element 108 is disposed on the light sensingdevice 102. The optical element 108 may be another element (such as amicrolens array) disposed on the light sensing device 102 or may be aportion of the light sensing device 102. That is, in one embodiment, thelight sensing device 102 includes the optical element 108. The opticalelement 108 has a light receiving surface 108 a.

The image sensor chip package 10 further includes a conducting layer(which includes a through substrate conducting structure 110) extendingfrom the lower surface 100 b towards the upper surface 100 a of theimage sensor chip 100 and electrically connecting to the light sensingdevice 102. A package layer 112 is formed on the lower surface 100 b ofthe image sensor chip 100 and the conducting layer, wherein a shortestdistance dl between the light receiving surface 108 a and a bottomsurface 112 a of the package layer 112 is not larger than about 130 μm.In one embodiment, the shortest distance d is between about 10 μm andabout 100 μm. In another embodiment, the shortest distance d is betweenabout 20 μm and about 80 μm. The distance d of the image sensor chippackage according to embodiments of the invention may be significantlyreduced.

In one embodiment, because no support substrate is disposed on the lightreceiving surface 108 a of the optical element 108, the size of theimage sensor chip package 10 is much thinner when compared to that ofthe conventional image sensor chip package, and thus the image sensorchip package may be applied to electronic products, which are light,thin, short, and small, such as mobile phones. Note that because nosupport substrate is disposed on the light receiving surface 108 a ofthe image sensor chip package 10 according to embodiments of theinvention, light may be received by the light sensing device 102 morefavorably to achieve better light sensing quality.

While the invention has been described by way of example and in terms ofthe preferred embodiments, it is to be understood that the invention isnot limited to the disclosed embodiments. To the contrary, it isintended to cover various modifications and similar arrangements (aswould be apparent to those skilled in the art). Therefore, the scope ofthe appended claims should be accorded the broadest interpretation so asto encompass all such modifications and similar arrangements.

1. A method for forming an image sensor chip package, comprising:providing a substrate having a plurality of predetermined scribe linesdefined thereon, wherein the predetermined scribe lines define aplurality of device regions in the substrate and each of the deviceregions has at least a device formed therein; disposing a supportsubstrate on a first surface of the substrate; forming at least a spacerlayer between the support substrate and the substrate, wherein thespacer layer covers the predetermined scribe lines; forming a packagelayer on a second surface of the substrate; forming a plurality ofconducting structures on the second surface of the substrate, whereinthe conducting structures are electrically connected to thecorresponding device in corresponding one of the device regions,respectively; and performing a dicing process including dicing thesupport substrate, the spacer layer, and the substrate along thepredetermined scribe lines such that the support substrate is removedfrom the substrate and the substrate is separated into a plurality ofindividual image sensor chip packages.
 2. The method for forming animage sensor chip package as claimed in claim 1, wherein thepredetermined scribe lines comprise a plurality of first directionpredetermined scribe lines substantially parallel to a first directionand a plurality of second direction predetermined scribe linessubstantially parallel to a second direction, wherein the firstdirection is substantially perpendicular to the second direction.
 3. Themethod for forming an image sensor chip package as claimed in claim 2,wherein the dicing process comprises: dicing and removing a portion ofthe support substrate and a portion of the spacer layer covering thefirst direction predetermined scribe lines from a surface of the supportsubstrate along the first direction predetermined scribe lines; afterthe support substrate is partially diced and removed, forming a firstfix layer on the surface of the support substrate; and dicing andremoving a portion of the first fix layer, a portion of the supportsubstrate, and a portion of the spacer layer covering the seconddirection predetermined scribe lines from the surface of the supportsubstrate along the second direction predetermined scribe lines suchthat the support substrate and the first fix layer are removed from thesubstrate.
 4. The method for forming an image sensor chip package asclaimed in claim 3, further comprising forming a second fix layer on thesurface of the support substrate before the dicing process is performed.5. The method for forming an image sensor chip package as claimed inclaim 3, further comprising disposing a second support substrate on thesecond surface of the substrate before the dicing process is performed.6. The method for forming an image sensor chip package as claimed inclaim 5, wherein after the support substrate and the first fix layer areremoved from the substrate, the method further comprises dicing andremoving a portion of the substrate from the first surface of thesubstrate along the first direction predetermined scribe lines and thesecond direction predetermined scribe lines such that the substrate isseparated into a plurality of individual image sensor chip packages. 7.The method for forming an image sensor chip package as claimed in claim6, further comprising removing the second support substrate.
 8. Themethod for forming an image sensor chip package as claimed in claim 7,wherein before the second support substrate is removed, the methodfurther comprises attaching a film frame on the separated image sensorchip packages.
 9. The method for forming an image sensor chip package asclaimed in claim 1, further comprising thinning the substrate from thesecond surface of the substrate to a predetermined thickness before theconducting structures are formed.
 10. The method for forming an imagesensor chip package as claimed in claim 1, further comprising forming aplurality of through substrate conducting structures in the substrate,wherein the through substrate conducting structures electrically connectcorresponding one of the devices and corresponding one of the conductingstructures, respectively.
 11. The method for forming an image sensorchip package as claimed in claim 1, further comprising respectivelydisposing an optical element on the devices in the device regions.12-18. (canceled)